Highly Stable Vanadium Oxide Cathodes Prepared by Plasma-Enhanced Chemical Vapor Deposition

Ji Guang Zhang, Ping Liu, John A. Turner, C. Edwin Tracy, Dave K. Benson

Research output: Contribution to journalArticlepeer-review

30 Scopus Citations


Vanadium oxide films have been prepared by plasma-enhanced chemical vapor deposition for rechargeable lithium-battery applications. Vanadium oxytrichloride (VOCl3) was employed as the vanadium precursor. Various parameters, such as the partial pressures of carrier gas and reactant gases, substrate temperature, and radio-frequency power, have been optimized to improve the electrochemical properties of the films. The film deposition rate was ∼11 Å/s. The best films obtained in this work displayed an oxygen-to-vanadium atomic ratio close to that of V6O13. These films exhibited a high discharge capacity and were very stable during electrochemical cycling. The discharge capacity of these films exceeded 408 mAh/g (or 1265 mAh/cm3) when tested between 4.0 and 1.5 V, and the energy density of these films (∼5000 Å thick) was 960.3 Wh/kg. The films exhibited negligible capacity fade from the second cycle to more than 5800 cycles when cycled between 4.0 and 1.8 V with a current density of 114 μA/cm2. The combination of high capacity, extended cycling stability, and rapid deposition rate make both this material and its deposition technology very attractive choices for the manufacturers of rechargeable lithium batteries.

Original languageAmerican English
Pages (from-to)1889-1892
Number of pages4
JournalJournal of the Electrochemical Society
Issue number6
StatePublished - 1998

NREL Publication Number

  • NREL/JA-590-23900


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