Abstract
To probe the sensitivity for localized heating of commercial amorphous silicon and crystalline modules, several intrusive and nonintrusive experiments were performed. In the intrusive experiments, each cell in several commercial amorphous silicon modules was evaluated separately and in groups for localized heating effects. Damage in amorphous silicon modules occcurred under reverse-bias conditions in the dark above a 5-20 mAcm-2 cell current density at the interconnection between cells. Shading can cause a larger temperature rise than current mismatch. For the monolithic amorphous silicon modules investigated, the current mismatch between each cell was substantial, but the temperature rise was negligible because of the rather low shunt resistance.
Original language | American English |
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Pages | 547-552 |
Number of pages | 6 |
DOIs | |
State | Published - 1992 |
Externally published | Yes |
Event | The Conference Record of the Twenty-Second IEEE Photovoltaic Specialists Conference - 1991 - Las Vegas, NV, USA Duration: 7 Oct 1991 → 11 Oct 1991 |
Conference
Conference | The Conference Record of the Twenty-Second IEEE Photovoltaic Specialists Conference - 1991 |
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City | Las Vegas, NV, USA |
Period | 7/10/91 → 11/10/91 |
NREL Publication Number
- SERI/CP-213-4539