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How Deposition Parameters Control Growth Dynamics of nc-Si Deposited by Hot-Wire Chemical Vapor Deposition
H. R. Moutinho, B. To, C. S. Jiang, Y. Xu, B. P. Nelson, C. W. Teplin, K. M. Jones, J. Perkins, M. M. Al-Jassim
Research output: Contribution to journal › Article › peer-review
9
Scopus Citations