Hydrogen Incorporation in Silicon Thin Films Deposited with a Remote Hydrogen Plasma

Research output: Contribution to journal › Article

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NREL Publication Number

@article{4f46a9f80f734e8691fdfeb04165254b,

title = "Hydrogen Incorporation in Silicon Thin Films Deposited with a Remote Hydrogen Plasma",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California",

year = "1989",

doi = "10.1063/1.101264",

language = "American English",

volume = "54",

pages = "1872--1874",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "19",

}

TY - JOUR

T1 - Hydrogen Incorporation in Silicon Thin Films Deposited with a Remote Hydrogen Plasma

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1989

Y1 - 1989

U2 - 10.1063/1.101264

DO - 10.1063/1.101264

M3 - Article

SN - 0003-6951

VL - 54

SP - 1872

EP - 1874

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

ER -