Abstract
Thin hydrogenated amorphous silicon (a-Si:H) layers deposited by hot-wire chemical vapor deposition (HWCVD) are investigated as emitters and back-surface-field (BSF) contacts to make silicon heterojunction solar cells on p-type crystalline silicon wafers. A common requirement for excellent emitter and BSF quality is minimization of interface recombination. Best results require immediate a Si:Hdeposition and an abrupt and flat interface to the c-Si substrate. We obtain record 16.9% and 14.8% efficiencies on p-type planar float-zone (FZ) and Czochralski (CZ) silicon substrates, respectively, with HWCVD a-Si:H(n) emitters and Al-BSF contacts. Initial efforts with p-type HWCVD Si thin films as the BSF have yielded 12.5% efficiency on p type CZ-Si.
| Original language | American English |
|---|---|
| Number of pages | 5 |
| State | Published - 2005 |
| Event | 2004 DOE Solar Energy Technologies Program Review Meeting - Denver, Colorado Duration: 25 Oct 2004 → 28 Oct 2004 |
Conference
| Conference | 2004 DOE Solar Energy Technologies Program Review Meeting |
|---|---|
| City | Denver, Colorado |
| Period | 25/10/04 → 28/10/04 |
Bibliographical note
Presented at the 2004 DOE Solar Energy Technologies Program Review Meeting, 25-28 October 2004, Denver, Colorado. Also included in the proceedings available on CD-ROM (DOE/GO-102005-2067; NREL/CD-520-37140)NREL Publication Number
- NREL/CP-520-37033
Keywords
- amorphous silicon (a-si:h)
- back surface fields (BSF)
- crystalline silicon wafers
- heterojunctions
- hot-wire chemical vapor deposition (HWCVD)
- hydrogenate
- p-Type
- PV
- solar cells
- thin films