Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films

M. Bär; K. S. Ahn; S. Shet; Y. Yan; L. Weinhardt; O. Fuchs; M. Blum; S. Pookpanratana; K. George; W. Yang; J. D. Denlinger; M. Al-Jassim; C. Heske

doi:10.1063/1.3056638

Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films

M. Bär
, K. S. Ahn
, S. Shet
, Y. Yan
, L. Weinhardt
, O. Fuchs
, M. Blum
, S. Pookpanratana
, K. George
, W. Yang
, J. D. Denlinger
, M. Al-Jassim
, C. Heske

Materials Science

Research output: Contribution to journal › Article › peer-review

15 Scopus Citations

Abstract

The chemical and electronic surface structure of ZnO: Zn3 N2 (ZnO:N) thin films with different N contents was investigated by soft x-ray emission spectroscopy. Upon exposure to ambient air (in contrast to storage in vacuum), the chemical and electronic surface structure of the ZnO:N films changes substantially. In particular, we find that the Zn3 N2 (Zn3 N2 +ZnO) ratio decreases with exposure time and that this change depends on the initial N content. We suggest a degradation mechanism based on the reaction of the Zn3 N2 content with atmospheric humidity.

Original language	American English
Article number	Article No. 012110
Number of pages	3
Journal	Applied Physics Letters
Volume	94
Issue number	1
DOIs	https://doi.org/10.1063/1.3056638 https://doi.org/10.1063/1.3056638
State	Published - 2009

NLR Publication Number

NREL/JA-520-45344

Keywords

materials science
thin films

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Bär, M., Ahn, K. S., Shet, S., Yan, Y., Weinhardt, L., Fuchs, O., Blum, M., Pookpanratana, S., George, K., Yang, W., Denlinger, J. D., Al-Jassim, M., & Heske, C. (2009). Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films. Applied Physics Letters, 94(1), Article Article No. 012110. https://doi.org/10.1063/1.3056638, https://doi.org/10.1063/1.3056638

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title = "Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films",

abstract = "The chemical and electronic surface structure of ZnO: Zn3 N2 (ZnO:N) thin films with different N contents was investigated by soft x-ray emission spectroscopy. Upon exposure to ambient air (in contrast to storage in vacuum), the chemical and electronic surface structure of the ZnO:N films changes substantially. In particular, we find that the Zn3 N2 (Zn3 N2 +ZnO) ratio decreases with exposure time and that this change depends on the initial N content. We suggest a degradation mechanism based on the reaction of the Zn3 N2 content with atmospheric humidity.",

keywords = "materials science, thin films",

author = "M. B{\"a}r and Ahn, \{K. S.\} and S. Shet and Y. Yan and L. Weinhardt and O. Fuchs and M. Blum and S. Pookpanratana and K. George and W. Yang and Denlinger, \{J. D.\} and M. Al-Jassim and C. Heske",

year = "2009",

doi = "10.1063/1.3056638",

language = "American English",

volume = "94",

journal = "Applied Physics Letters",

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publisher = "American Institute of Physics",

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}

Bär, M, Ahn, KS, Shet, S, Yan, Y, Weinhardt, L, Fuchs, O, Blum, M, Pookpanratana, S, George, K, Yang, W, Denlinger, JD, Al-Jassim, M & Heske, C 2009, 'Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films', Applied Physics Letters, vol. 94, no. 1, Article No. 012110. https://doi.org/10.1063/1.3056638, https://doi.org/10.1063/1.3056638

TY - JOUR

T1 - Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films

AU - Bär, M.

AU - Ahn, K. S.

AU - Shet, S.

AU - Yan, Y.

AU - Weinhardt, L.

AU - Fuchs, O.

AU - Blum, M.

AU - Pookpanratana, S.

AU - George, K.

AU - Yang, W.

AU - Denlinger, J. D.

AU - Al-Jassim, M.

AU - Heske, C.

PY - 2009

Y1 - 2009

N2 - The chemical and electronic surface structure of ZnO: Zn3 N2 (ZnO:N) thin films with different N contents was investigated by soft x-ray emission spectroscopy. Upon exposure to ambient air (in contrast to storage in vacuum), the chemical and electronic surface structure of the ZnO:N films changes substantially. In particular, we find that the Zn3 N2 (Zn3 N2 +ZnO) ratio decreases with exposure time and that this change depends on the initial N content. We suggest a degradation mechanism based on the reaction of the Zn3 N2 content with atmospheric humidity.

AB - The chemical and electronic surface structure of ZnO: Zn3 N2 (ZnO:N) thin films with different N contents was investigated by soft x-ray emission spectroscopy. Upon exposure to ambient air (in contrast to storage in vacuum), the chemical and electronic surface structure of the ZnO:N films changes substantially. In particular, we find that the Zn3 N2 (Zn3 N2 +ZnO) ratio decreases with exposure time and that this change depends on the initial N content. We suggest a degradation mechanism based on the reaction of the Zn3 N2 content with atmospheric humidity.

KW - materials science

KW - thin films

UR - https://www.scopus.com/pages/publications/58149504131

U2 - 10.1063/1.3056638

DO - 10.1063/1.3056638

M3 - Article

AN - SCOPUS:58149504131

SN - 0003-6951

VL - 94

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 1

M1 - Article No. 012110

ER -

Impact of Air Exposure on the Chemical and Electronic Structure of ZnO:Zn3N2 Thin Films

Abstract

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Keywords

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