Improved 750 Degrees C Expitaxial Crystal Silicon Solar Cells Through Impurity Reduction

Sachit Grover, David L. Young, Vincenzo Lasalvia, Jian V. Li, Howard M. Branz, Paul Stradins, Charles W. Teplin

Research output: Contribution to conferencePaperpeer-review

1 Scopus Citations

Abstract

We characterize and improve epitaxial silicon films for solar cells grown by hot-wire chemical vapor deposition (HWCVD). The hot-wire filament temperature is found to affect the incorporation of impurities and the surface roughness of the films. Lowering the filament temperature leads to improved epitaxial films with lower impurities and smoother surfaces. Solar cells made with the improved material grown on low-cost silicon templates have open-circuit voltages (V OC) ∼600 mV and efficiency exceeding 10%.

Original languageAmerican English
Pages51-53
Number of pages3
DOIs
StatePublished - 2013
Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States
Duration: 16 Jun 201321 Jun 2013

Conference

Conference39th IEEE Photovoltaic Specialists Conference, PVSC 2013
Country/TerritoryUnited States
CityTampa, FL
Period16/06/1321/06/13

NREL Publication Number

  • NREL/CP-5200-57911

Keywords

  • DLTS
  • Epitaxial silicon
  • Hot-wire CVD
  • Impurities
  • Solar cells

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