Abstract
An initial conversion efficiency of 13.5 percent has been obtained on a triple-junction triple-bandgap device fabricated in a large-area deposition reactor capable of producing one-square-foot modules. The intrinsic layer of the top cell is a wide bandgap amorphous silicon alloy. The middle and bottom cells employ high quality amorphous silicon-germanium alloy. The high efficiency of thetriple-junction cell is attributed to the relative reduction of the optical loss in the top tunnel junction and the improvement in the quality of the middle and bottom component cells. Triple-junction devices with initial efficiency of 13.3 percent have shown saturation at 11.6 percent after light soaking. Modules of aperture area 909 cm2 have been fabricated using an assembly process similar tothe one being currently used in our manufacturing line. The module design consists of one large-area, high-current monolithic multijunction device. The status of the small-area devices and modules is described.
Original language | American English |
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Pages | 711-716 |
Number of pages | 6 |
State | Published - 1997 |
Event | Amorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium - San Francisco, California Duration: 31 Mar 1997 → 4 Apr 1997 |
Conference
Conference | Amorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium |
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City | San Francisco, California |
Period | 31/03/97 → 4/04/97 |
Bibliographical note
Work performed by United Solar Systems Corp., Troy, MichiganNREL Publication Number
- NREL/CP-520-24561