Improved Efficiency and Stability of Silicon Photocathodes by Electrochemical Etching

D. Mao; K. J. Kim; Y. S. Tsuo; Arthur J. Frank

doi:10.1021/j100011a035

Improved Efficiency and Stability of Silicon Photocathodes by Electrochemical Etching

D. Mao, K. J. Kim, Y. S. Tsuo, Arthur J. Frank

Chemistry and Nanoscience

Research output: Contribution to journal › Article › peer-review

11 Scopus Citations

Abstract

The photoelectrochemical behavior of electrochemically etched Si cathodes contacting a nonaqueous redox electrolyte is described. The electrochemically etched Si electrodes exhibit higher energy conversion efficiencies than Si electrodes chemically treated in HF solution. The porous Si layer formed during electrochemical etching plays an important role in suppressing surface recombination and stabilizing the Si electrodes against photocorrosion.

Original language	American English
Pages (from-to)	3643-3647
Number of pages	5
Journal	Journal of Physical Chemistry
Volume	99
Issue number	11
DOIs	https://doi.org/10.1021/j100011a035 https://doi.org/10.1021/j100011a035
State	Published - 1995

NREL Publication Number

NREL/JA-452-6616

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@article{7ee23f30a9394a5980443df0c9346d52,

title = "Improved Efficiency and Stability of Silicon Photocathodes by Electrochemical Etching",

abstract = "The photoelectrochemical behavior of electrochemically etched Si cathodes contacting a nonaqueous redox electrolyte is described. The electrochemically etched Si electrodes exhibit higher energy conversion efficiencies than Si electrodes chemically treated in HF solution. The porous Si layer formed during electrochemical etching plays an important role in suppressing surface recombination and stabilizing the Si electrodes against photocorrosion.",

author = "D. Mao and Kim, {K. J.} and Tsuo, {Y. S.} and Frank, {Arthur J.}",

year = "1995",

doi = "10.1021/j100011a035",

language = "American English",

volume = "99",

pages = "3643--3647",

journal = "Journal of Physical Chemistry",

issn = "0022-3654",

publisher = "American Chemical Society",

number = "11",

}

TY - JOUR

T1 - Improved Efficiency and Stability of Silicon Photocathodes by Electrochemical Etching

AU - Mao, D.

AU - Kim, K. J.

AU - Tsuo, Y. S.

AU - Frank, Arthur J.

PY - 1995

Y1 - 1995

N2 - The photoelectrochemical behavior of electrochemically etched Si cathodes contacting a nonaqueous redox electrolyte is described. The electrochemically etched Si electrodes exhibit higher energy conversion efficiencies than Si electrodes chemically treated in HF solution. The porous Si layer formed during electrochemical etching plays an important role in suppressing surface recombination and stabilizing the Si electrodes against photocorrosion.

AB - The photoelectrochemical behavior of electrochemically etched Si cathodes contacting a nonaqueous redox electrolyte is described. The electrochemically etched Si electrodes exhibit higher energy conversion efficiencies than Si electrodes chemically treated in HF solution. The porous Si layer formed during electrochemical etching plays an important role in suppressing surface recombination and stabilizing the Si electrodes against photocorrosion.

UR - http://www.scopus.com/inward/record.url?scp=0029271997&partnerID=8YFLogxK

U2 - 10.1021/j100011a035

DO - 10.1021/j100011a035

M3 - Article

AN - SCOPUS:0029271997

SN - 0022-3654

VL - 99

SP - 3643

EP - 3647

JO - Journal of Physical Chemistry

JF - Journal of Physical Chemistry

IS - 11

ER -

Improved Efficiency and Stability of Silicon Photocathodes by Electrochemical Etching

Abstract

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