Improved mu-c-Si p-Layer and a-Si i-Layer Materials using VHF Plasma Deposition

    Research output: Contribution to conferencePaper


    Microcrystalline Si p-layers have been widely used in a-Si solar cell technology to achieve high efficiency. To further improve the solar cell performance, we have studied the deposition of high quality p-layer material using a modified very high frequency (VHF) plasma enhanced CVD process and consequently have improved the solar cell current. This improvement was primarily in the blueresponse which leads to a 6-10% improvement in the overall solar cell efficiency. In addition, we have explored the deposition of a-Si at high rates using VHF plasma, and compared these VHF i-layers with RF plasma deposited i-layers. With improved deposition conditions, VHF intrinsic layers deposited at a rate up to 15 ..angstrom../s show similar device performance and light stability to VHF andRF i-layers deposited at low rates, and show higher stability than RF i-layers deposited at high rates in the same deposition system. A 10.9% single-junction solar cell was fabricated using a VHF deposited i-layer.
    Original languageAmerican English
    Number of pages4
    StatePublished - 1997
    EventTwenty Sixth IEEE Photovoltaic Specialists Conference - Anaheim, California
    Duration: 29 Sep 19973 Oct 1997


    ConferenceTwenty Sixth IEEE Photovoltaic Specialists Conference
    CityAnaheim, California

    Bibliographical note

    Work performed by Energy Conversion Devices, Inc., Troy, Michigan

    NREL Publication Number

    • NREL/CP-520-24979


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