In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries

J. D. Perkins; M. F.A.M. van Hest; C. W. Teplin; M. S. Dabney; D. S. Ginley

doi:10.1016/j.apsusc.2007.05.094

In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries

J. D. Perkins, M. F.A.M. van Hest, C. W. Teplin, M. S. Dabney, D. S. Ginley

Materials, Chemical, and Computational Science

National Renewable Energy Laboratory

Research output: Contribution to journal › Article › peer-review

2 Scopus Citations

Abstract

We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In-Mo-O composition spread library is presented as an example.

Original language	American English
Pages (from-to)	687-691
Number of pages	5
Journal	Applied Surface Science
Volume	254
Issue number	3
DOIs	https://doi.org/10.1016/j.apsusc.2007.05.094 https://doi.org/10.1016/j.apsusc.2007.05.094
State	Published - 2007

NREL Publication Number

NREL/JA-520-42605

Keywords

Combinatorial material science
In situ measurements
Sputtering
Thin film

Access to Document

Cite this

@article{c1af1d3620f243baa43a7a457dcda0d6,

title = "In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries",

abstract = "We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In-Mo-O composition spread library is presented as an example.",

keywords = "Combinatorial material science, In situ measurements, Sputtering, Thin film",

author = "Perkins, {J. D.} and {van Hest}, {M. F.A.M.} and Teplin, {C. W.} and Dabney, {M. S.} and Ginley, {D. S.}",

year = "2007",

doi = "10.1016/j.apsusc.2007.05.094",

language = "American English",

volume = "254",

pages = "687--691",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

number = "3",

}

TY - JOUR

T1 - In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries

AU - Perkins, J. D.

AU - van Hest, M. F.A.M.

AU - Teplin, C. W.

AU - Dabney, M. S.

AU - Ginley, D. S.

PY - 2007

Y1 - 2007

N2 - We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In-Mo-O composition spread library is presented as an example.

AB - We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In-Mo-O composition spread library is presented as an example.

KW - Combinatorial material science

KW - In situ measurements

KW - Sputtering

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=36148956583&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2007.05.094

DO - 10.1016/j.apsusc.2007.05.094

M3 - Article

AN - SCOPUS:36148956583

SN - 0169-4332

VL - 254

SP - 687

EP - 691

JO - Applied Surface Science

JF - Applied Surface Science

IS - 3

ER -

In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries

Abstract

NREL Publication Number

Keywords

Access to Document

Other files and links

Fingerprint

Cite this