In Situ Etch Rate Measurements of Thin Film Combinatorial Libraries

J. D. Perkins, M. F.A.M. van Hest, C. W. Teplin, M. S. Dabney, D. S. Ginley

Research output: Contribution to journalArticlepeer-review

2 Scopus Citations


We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In-Mo-O composition spread library is presented as an example.

Original languageAmerican English
Pages (from-to)687-691
Number of pages5
JournalApplied Surface Science
Issue number3
StatePublished - 2007

NREL Publication Number

  • NREL/JA-520-42605


  • Combinatorial material science
  • In situ measurements
  • Sputtering
  • Thin film


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