In-Situ Studies of the Growth of Amorphous and Nanocrystalline Silicon Using Real Time Spectroscopic Ellipsometry

Material Science

• Amorphous Silicon 100%
• Chemical Vapor Deposition 100%
• Film Growth 100%
• Nanocrystalline Silicon 100%
• Film 50%
• Photovoltaics 50%
• Structural Property 50%
• Nanocrystalline 50%
• Surface Roughness 50%
• Dilution 50%
• Device Efficiency 50%

Engineering

• Nanocrystalline 100%
• Situ Study 100%
• Chemical Vapor Deposition 66%
• Photovoltaics 33%
• Substrate Temperature 33%
• Hydrogen Dilution 33%
• Good Correlation 33%
• Conductivity Measurement 33%
• Maximization 33%
• Structural Property 33%
• Gas Pressure 33%
• Parameter Space 33%