Incorporation of Boron during Thermal Chemical Vapor Deposition of Doped Hydrogenated Amorphous Silicon

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NREL Publication Number

@article{3cc37902885b4d1283be3ece0bb095de,

title = "Incorporation of Boron during Thermal Chemical Vapor Deposition of Doped Hydrogenated Amorphous Silicon",

author = "NREL",

year = "1987",

doi = "10.1063/1.98802",

language = "American English",

volume = "51",

pages = "922--924",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "12",

}