Incorporation of Boron during Thermal Chemical Vapor Deposition of Doped Hydrogenated Amorphous Silicon

Research output: Contribution to journalArticlepeer-review

Original languageAmerican English
Pages (from-to)922-924
Number of pages3
JournalApplied Physics Letters
Volume51
Issue number12
DOIs
StatePublished - 1987

NREL Publication Number

  • SERI/JA-520-17086

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