Abstract
Indium phosphide, a direct gap semiconductor with a room temperature energy gap of 1. 35 eV, is a promising photovoltaic material for thin film devices. Thin films of indium phosphide have been deposited on several foreign substrates by the halide process, and their structural and electrical properties investigated. Schottky barriers prepared from these films are found to exhibit low rectification ratios, high dark currents, and poor photovoltaic response due to grain boundary effects.
Original language | American English |
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Pages | 661-666 |
Number of pages | 6 |
State | Published - 1980 |
Externally published | Yes |
Event | Conf Rec IEEE Photovoltaic Spec Conf 14th - San Diego, CA, USA Duration: 7 Jan 1980 → 10 Jan 1980 |
Conference
Conference | Conf Rec IEEE Photovoltaic Spec Conf 14th |
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City | San Diego, CA, USA |
Period | 7/01/80 → 10/01/80 |
NREL Publication Number
- ACNR/CP-213-4184