Influence of Discharge Current on the Intrinsic Stress in Mo Films Deposited Using Cylindrical and Planar Magnetron Sputtering Sources

doi:10.1116/1.572997

Influence of Discharge Current on the Intrinsic Stress in Mo Films Deposited Using Cylindrical and Planar Magnetron Sputtering Sources

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	576-579
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	3
Issue number	3, Part I
DOIs	https://doi.org/10.1116/1.572997
State	Published - 1985

Bibliographical note

Work performed by Coordinated Science Laboratory and Department of Metallurgy, University of Illinois, Urbana, Illinois, and Ford Motor Company, Dearborn, Michigan

NREL Publication Number

ACNR/JA-6710

Access to Document

10.1116/1.572997

Cite this

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title = "Influence of Discharge Current on the Intrinsic Stress in Mo Films Deposited Using Cylindrical and Planar Magnetron Sputtering Sources",

author = "NREL",

note = "Work performed by Coordinated Science Laboratory and Department of Metallurgy, University of Illinois, Urbana, Illinois, and Ford Motor Company, Dearborn, Michigan",

year = "1985",

doi = "10.1116/1.572997",

language = "American English",

volume = "3",

pages = "576--579",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "3, Part I",

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N1 - Work performed by Coordinated Science Laboratory and Department of Metallurgy, University of Illinois, Urbana, Illinois, and Ford Motor Company, Dearborn, Michigan

PY - 1985

Y1 - 1985

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DO - 10.1116/1.572997

M3 - Article

SN - 0734-2101

VL - 3

SP - 576

EP - 579

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 3, Part I

ER -