Influence of Plasma Chemistry on the Properties of Amorphous (Si,Ge) Alloy Devices

Influence of Plasma Chemistry on the Properties of Amorphous (Si,Ge) Alloy Devices

Research output: Contribution to conference › Paper

Original language	American English
Pages	441-446
Number of pages	6
State	Published - 1999
Event	Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium - San Francisco, California Duration: 14 Apr 1998 → 17 Apr 1998

Conference

Conference	Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium
City	San Francisco, California
Period	14/04/98 → 17/04/98

Bibliographical note

Work performed by Iowa State University, Ames, Iowa

NREL Publication Number

NREL/CP-520-27264

Cite this

@conference{a24d72f88d8441c198b18864899efc2d,

title = "Influence of Plasma Chemistry on the Properties of Amorphous (Si,Ge) Alloy Devices",

author = "NREL",

note = "Work performed by Iowa State University, Ames, Iowa; Amorphous and Microcrystalline Silicon Technology 1998: Materials Research Society Symposium ; Conference date: 14-04-1998 Through 17-04-1998",

year = "1999",

language = "American English",

pages = "441--446",

}