Influence of Pressure and Annealing on the Microstructural and Electro-Optical Properties of RF Magnetron Sputtered ITO Thin Films

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	993-1003
Number of pages	11
Journal	Materials Research Bulletin
Volume	39
DOIs	https://doi.org/10.1016/j.materresbull.2004.03.008
State	Published - 2004

NREL Publication Number

@article{d7e68833828046c195f8536a8855e1d9,

title = "Influence of Pressure and Annealing on the Microstructural and Electro-Optical Properties of RF Magnetron Sputtered ITO Thin Films",

author = "NREL",

year = "2004",

doi = "10.1016/j.materresbull.2004.03.008",

language = "American English",

volume = "39",

pages = "993--1003",

journal = "Materials Research Bulletin",

issn = "0025-5408",

publisher = "Elsevier Ltd.",

}

TY - JOUR

T1 - Influence of Pressure and Annealing on the Microstructural and Electro-Optical Properties of RF Magnetron Sputtered ITO Thin Films

AU - NREL, null

PY - 2004

Y1 - 2004

U2 - 10.1016/j.materresbull.2004.03.008

DO - 10.1016/j.materresbull.2004.03.008

M3 - Article

SN - 0025-5408

VL - 39

SP - 993

EP - 1003

JO - Materials Research Bulletin

JF - Materials Research Bulletin

ER -