Influence of Substrate Temperature and RF Power on the Formation of ZnO Nanorods for Solar Driven Hydrogen Production

Sudhakar Shet, Heli Wang, Yanfa Yan, Nuggehalli Ravindra, John Turner, Mowafak Al-Jassim

Research output: Chapter in Book/Report/Conference proceedingChapterpeer-review

1 Scopus Citations

Abstract

We report on the effects of substrate temperature and RF power on the formation of aligned nanorods in ZnO thin films. ZnO thin films were sputter-deposited in mixed Ar and N2 gas ambient at various substrate temperatures and RF power. At low substrate temperatures (below 300°C), ZnO nanorods do not form regardless of RF power. High RF power helps to promote the formation of aligned ZnO nanorods. However, lower RF power usually lead to ZnO films with better crystallinity at the same substrate temperatures in mixed Ar and N2 gas ambient and therefore better photoelectrochemieal (PEC) response.

Original languageAmerican English
Title of host publicationAdvances in Synthesis, Processing, and Applications of Nanostructures
Subtitle of host publicationCeramic Transactions, Volume 238
EditorsK. Lu, N. J. Manjooran, R. Murakami
PublisherAmerican Ceramic Society
Pages115-120
Number of pages6
ISBN (Print)9781118273272
DOIs
StatePublished - 2012
EventAdvances in Synthesis, Processing, and Applications of Nanostructures - Materials Science and Technology 2011 Conference, MS and T 2011 - Columbus, OH, United States
Duration: 16 Oct 201120 Oct 2011

Publication series

NameCeramic Transactions
Volume238
ISSN (Print)1042-1122

Conference

ConferenceAdvances in Synthesis, Processing, and Applications of Nanostructures - Materials Science and Technology 2011 Conference, MS and T 2011
Country/TerritoryUnited States
CityColumbus, OH
Period16/10/1120/10/11

NREL Publication Number

  • NREL/CH-5200-57807

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