Influence of W Filament Alloying on the Electronic Properties of HWCVD Deposited a-Si:H Films

Research output: Contribution to conferencePaper

Original languageAmerican English
PagesA6.6.1-A6.6.6
StatePublished - 2001
EventAmorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium - San Francisco, California
Duration: 24 Apr 200028 Apr 2000

Conference

ConferenceAmorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium
CitySan Francisco, California
Period24/04/0028/04/00

NREL Publication Number

  • NREL/CP-520-30435

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