Influence of W Filament Alloying on the Electronic Properties of HWCVD Deposited a-Si:H Films

Research output: Contribution to conference › Paper

Original language	American English
Pages	A6.6.1-A6.6.6
State	Published - 2001
Event	Amorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium - San Francisco, California Duration: 24 Apr 2000 → 28 Apr 2000

Conference	Amorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium
City	San Francisco, California
Period	24/04/00 → 28/04/00

NREL Publication Number

@conference{0e1473c3ddb24b778a95582fa4b9c037,

title = "Influence of W Filament Alloying on the Electronic Properties of HWCVD Deposited a-Si:H Films",

author = "NREL",

year = "2001",

language = "American English",

pages = "A6.6.1--A6.6.6",

note = "Amorphous and Heterogeneous Silicon Thin Films 2000: Materials Research Society Symposium ; Conference date: 24-04-2000 Through 28-04-2000",

}