Interfacial Layer Growth Condition Dependent Carrier Transport Mechanisms in HfO2/SiO2 Gate Stacks: Article No. 232903

Santosh Sahoo

Research output: Contribution to journal › Article › peer-review

NREL Publication Number

@article{27b4652d9aa24beca0909ccefff7e1f5,

title = "Interfacial Layer Growth Condition Dependent Carrier Transport Mechanisms in HfO2/SiO2 Gate Stacks: Article No. 232903",

author = "Santosh Sahoo",

year = "2012",

doi = "10.1063/1.4726186",

language = "American English",

volume = "100",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "23",

}