Abstract
Efficient indium tin oxide (ITO)/p-InP solar cells have been fabricated by ion beam deposition. In this letter, a critical evaluation of the ITO/InP interface is presented using complementary capacitance-voltage and ion microprobe measurements. We have found that deposition of ITO produces a semi-insulating region at the InP surface. This high resistivity layer extends about 750 Å into the bulk. We have evidence that this region is due to surface accumulation of compensating impurities.
| Original language | American English |
|---|---|
| Pages (from-to) | 727-729 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 41 |
| Issue number | 8 |
| DOIs | |
| State | Published - 1982 |
NREL Publication Number
- ACNR/JA-213-4100