Abstract
We demonstrate high efficiency performance in two ultra-thin, Ge-free III-V semiconductor triple-junction solar cell device designs grown in an inverted configuration. Low-stress metamorphic junctions were engineered to achieve excellent photovoltaic performance with less than 3 x 106 cm-2 threading dislocations. The first design with band gaps of 1.83/1.40/1.00 eV, containing a singlemetamorphic junction, achieved 33.8% and 39.2% efficiencies under the standard one-sun global spectrum and concentrated direct spectrum at 131 suns, respectively. The second design with band gaps of 1.83/1.34/0.89 eV, containing two metamorphic junctions achieved 33.2% and 40.1% efficiencies under the standard one-sun global spectrum and concentrated direct spectrum at 143 suns, respectively.
Original language | American English |
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Number of pages | 8 |
State | Published - 2008 |
Event | 33rd IEEE Photovoltaic Specialists Conference - San Diego, California Duration: 11 May 2008 → 16 May 2008 |
Conference
Conference | 33rd IEEE Photovoltaic Specialists Conference |
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City | San Diego, California |
Period | 11/05/08 → 16/05/08 |
NREL Publication Number
- NREL/CP-520-42547
Keywords
- GE Free
- high efficiency
- inverted configuration
- low-stress
- metamorphic junction
- PV
- semiconductor
- solar cells
- solar spectrum
- triple-junction