Ion Implantation Processes in Silicon

    Research output: Chapter in Book/Report/Conference proceedingChapter

    Original languageAmerican English
    Title of host publicationImpurity Doping in Silicon
    Subtitle of host publicationMaterials Processing Theory and Practices, Volme 2
    EditorsF. F. Y. Wang
    Pages55-146
    DOIs
    StatePublished - 1981

    NREL Publication Number

    • ACNR/CH-211-6965

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