Kinetics of the Staebler-Wronski Effect in Hydrogenated Amorphous Silicon

Research output: Contribution to journal › Article

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NREL Publication Number

@article{ff704b57f9d64ce1bf024daf6dae881a,

title = "Kinetics of the Staebler-Wronski Effect in Hydrogenated Amorphous Silicon",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California",

year = "1984",

doi = "10.1063/1.95020",

language = "American English",

volume = "45",

pages = "1075--1077",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "10",

}

TY - JOUR

T1 - Kinetics of the Staebler-Wronski Effect in Hydrogenated Amorphous Silicon

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1984

Y1 - 1984

U2 - 10.1063/1.95020

DO - 10.1063/1.95020

M3 - Article

SN - 0003-6951

VL - 45

SP - 1075

EP - 1077

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 10

ER -