Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. II. Film Properties

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)2822-2829
    Number of pages8
    JournalJournal of Applied Physics
    Issue number7
    StatePublished - 1987

    Bibliographical note

    Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts

    NREL Publication Number

    • ACNR/JA-9665

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