Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. II. Film Properties

Research output: Contribution to journal › Article

Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts

NLR Publication Number

@article{e407bd4bd1a7452d8b67c7fae9d146a3,

title = "Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. II. Film Properties",

author = "NREL",

note = "Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts",

year = "1987",

doi = "10.1063/1.339413",

language = "American English",

volume = "62",

pages = "2822--2829",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "7",

}

TY - JOUR

T1 - Laser-Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon. II. Film Properties

AU - NREL, null

N1 - Work performed by Massachusetts Institute of Technology, Cambridge, Massachusetts

PY - 1987

Y1 - 1987

U2 - 10.1063/1.339413

DO - 10.1063/1.339413

M3 - Article

SN - 0021-8979

VL - 62

SP - 2822

EP - 2829

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 7

ER -