Abstract
Thin films of V2O5 and LiCoO2 were deposited by pulsed laser deposition (PLD) and the chemical diffusion coefficients, D were measured by potentiostatic intermittent titration technique (PITT). The PLD-grown V2O5 and LiCoO2 films are electrochemically similar to bulk powders and thin films produced by other techniques. In crystalline V2O5, the maximum and minimum D were found to be 1.7 × 10-12 cm2 s-1 and 5.8 × 10-15 cm2 s-1 respectively, with a general trend for D̃ to rise in single-phase regions. In amorphous V2O5 films, D̃ was initially 5 × 10-13 cm2 s-1 and decreased steadily to 1.2 × 10-13 cm2 s-1 at Li0.4V2O5. The decrease in D̃ then became more gradual with a final value of 5.52 × 10-14 cm2 s-1 at Li1.5V2O5. The chemical diffusion coefficient of Li in LiCoO2 films ranged from 1 × 10-12-4 × 10-11 cm2 s-1 with a pronounced minimum at Li0.7CoO2. Thin films of LiCo0.5Al0.5O2 also deposited by PLD exhibited limited cycling capabilities and an upper bound of D̃ = 9 × 10-13 cm2 s-1.
Original language | American English |
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Pages (from-to) | 187-196 |
Number of pages | 10 |
Journal | Electrochimica Acta |
Volume | 45 |
Issue number | 1-2 |
DOIs | |
State | Published - 1999 |
NREL Publication Number
- NREL/JA-520-27895
Keywords
- Amorphous
- Chronoamperometry
- Crystalline
- Li diffusion
- Licoalo
- Licoo
- Pulsed laser deposition
- Thin film
- Vo