Light Bias CPM Study of the Density of States in n-Type Amorphous Silicon

    Research output: Contribution to conferencePaper

    Abstract

    We measure subgap absorption on n-type amorphous silicon using the 'absolute' constant photocurrent method. We find that for typical monochromator probe beam intensities the measurement is not significantly influenced by lifetime changes. When the measurement is performed under light bias, an apparent increase in the defect absorption coefficient is observed, but no change in the photoexcitationthreshold or spectral shape of the absorption band is seen. We show that this increase is likely due to a bias-light amplification of spectrally dependent lifetime changes. Our measurements suggest a larger electron capture cross section of positive valence band tail states compared to neutral dangling bonds.
    Original languageAmerican English
    Pages703-708
    Number of pages6
    StatePublished - 1996
    EventAmorphous Silicon Technology 1996: Materials Research Society Symposium - San Francisco, California
    Duration: 8 Apr 199612 Apr 1996

    Conference

    ConferenceAmorphous Silicon Technology 1996: Materials Research Society Symposium
    CitySan Francisco, California
    Period8/04/9612/04/96

    NREL Publication Number

    • NREL/CP-23009

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