Abstract
We measure subgap absorption on n-type amorphous silicon using the 'absolute' constant photocurrent method. We find that for typical monochromator probe beam intensities the measurement is not significantly influenced by lifetime changes. When the measurement is performed under light bias, an apparent increase in the defect absorption coefficient is observed, but no change in the photoexcitationthreshold or spectral shape of the absorption band is seen. We show that this increase is likely due to a bias-light amplification of spectrally dependent lifetime changes. Our measurements suggest a larger electron capture cross section of positive valence band tail states compared to neutral dangling bonds.
Original language | American English |
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Pages | 703-708 |
Number of pages | 6 |
State | Published - 1996 |
Event | Amorphous Silicon Technology 1996: Materials Research Society Symposium - San Francisco, California Duration: 8 Apr 1996 → 12 Apr 1996 |
Conference
Conference | Amorphous Silicon Technology 1996: Materials Research Society Symposium |
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City | San Francisco, California |
Period | 8/04/96 → 12/04/96 |
NREL Publication Number
- NREL/CP-23009