Abstract
This report describes the first year of work performed by AstroPower, Inc., of Newark, Delaware, under the Thin-Film PV Partnership Program. The work led to the development of a new barrier-coated substrate that has enabled high-quality thin-layer polycrystalline silicon to be grown on a low-cost substrate. High diffusion lengths were measured after external phosphorous gettering. This led to aconfirmed 12.2% efficiency for a 0.57cm2, thin-layer solar cell grown on a low-cost substrate. ;
Original language | American English |
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Number of pages | 25 |
State | Published - 1996 |
Bibliographical note
Work performed by AstroPower, Inc., Newark, DelawareNREL Publication Number
- NREL/SR-413-20809