Liquid Precursor for Deposition of Copper Selenide and Method of Preparing the Same

Marinus Van Hest; David Ginley; Calvin Curtis; Alexander Miedaner; Peter Hersh; Louay Eldada; Billy Stanbery

Liquid Precursor for Deposition of Copper Selenide and Method of Preparing the Same

Marinus Van Hest (Inventor), David Ginley (Inventor), Calvin Curtis (Inventor), Alexander Miedaner (Inventor), Peter Hersh (Inventor), Louay Eldada (Inventor), Billy Stanbery (Inventor)

Research output: Patent

Abstract

Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.

Original language	American English
Patent number	9,130,084
Filing date	8/09/15
State	Published - 2015

NREL Publication Number

NREL/PT-5K00-65875

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title = "Liquid Precursor for Deposition of Copper Selenide and Method of Preparing the Same",

abstract = "Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.",

author = "{Van Hest}, Marinus and David Ginley and Calvin Curtis and Alexander Miedaner and Peter Hersh and Louay Eldada and Billy Stanbery",

year = "2015",

language = "American English",

type = "Patent",

note = "9,130,084",

}

TY - PAT

T1 - Liquid Precursor for Deposition of Copper Selenide and Method of Preparing the Same

AU - Van Hest, Marinus

AU - Ginley, David

AU - Curtis, Calvin

AU - Miedaner, Alexander

AU - Hersh, Peter

AU - Eldada, Louay

AU - Stanbery, Billy

PY - 2015

Y1 - 2015

N2 - Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.

AB - Liquid precursors containing copper and selenium suitable for deposition on a substrate to form thin films suitable for semiconductor applications are disclosed. Methods of preparing such liquid precursors and methods of depositing a precursor on a substrate are also disclosed.

M3 - Patent

M1 - 9,130,084

Y2 - 2015/09/08

ER -

Liquid Precursor for Deposition of Copper Selenide and Method of Preparing the Same

Abstract

NREL Publication Number

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