Low-Power Deposition of Fluorinated Microcrystalline Silicon Hydrogen Alloy Films

Swati Ray, S. C. De, Gautam Ganguly, A. K. Barua, A. J. Mascarenhas, M. M. Al-Jassim, S. K. Deb

Research output: Contribution to journalArticlepeer-review

7 Scopus Citations


Fluorinated microcrystalline silicon hydrogen alloy films have been prepared by the radio frequency glow-discharge decomposition of silicon tetrafluoride/hydrogen mixtures. Thereby, μc-Si:F:H films with high dark conductivity (∼10-3 Ω-1 cm-1), high photoconductivity (∼10- 4 Ω-1 cm-1), showing crystalline structure in selected-area transmission electron microscope diffraction patterns as well as sharp infrared absorption and Raman shift spectra have been obtained under conditions of low-power density (∼0.15 W cm-2) and hydrogen dilution (∼20%).

Original languageAmerican English
Pages (from-to)4024-4027
Number of pages4
JournalJournal of Applied Physics
Issue number10
StatePublished - 1989

Bibliographical note

Work performed by Solar Energy Research Institute, Golden, Colorado, and Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta, India

NREL Publication Number

  • ACNR/JA-212-11343


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