Abstract
Fluorinated microcrystalline silicon hydrogen alloy films have been prepared by the radio frequency glow-discharge decomposition of silicon tetrafluoride/hydrogen mixtures. Thereby, μc-Si:F:H films with high dark conductivity (∼10-3 Ω-1 cm-1), high photoconductivity (∼10- 4 Ω-1 cm-1), showing crystalline structure in selected-area transmission electron microscope diffraction patterns as well as sharp infrared absorption and Raman shift spectra have been obtained under conditions of low-power density (∼0.15 W cm-2) and hydrogen dilution (∼20%).
Original language | American English |
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Pages (from-to) | 4024-4027 |
Number of pages | 4 |
Journal | Journal of Applied Physics |
Volume | 65 |
Issue number | 10 |
DOIs | |
State | Published - 1989 |
Bibliographical note
Work performed by Solar Energy Research Institute, Golden, Colorado, and Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta, IndiaNREL Publication Number
- ACNR/JA-212-11343