Metallization for Self Aligned Technology: Cooperative Research and Development Final Report, CRADA Number CRD-08-295

David Ginley

doi:10.2172/1039801

Metallization for Self Aligned Technology: Cooperative Research and Development Final Report, CRADA Number CRD-08-295

David Ginley

Materials, Chemical, and Computational Science

Research output: NREL › Technical Report

Abstract

In this CRADA NREL will modify/develop metallization inks that are compatible with 1366 Technologies technology. Various methods of deposition will be used to apply the inks to the textured silicon substrates. The goal of the project is to minimize the contact resistance while maximizing the cell efficiency.

Original language	American English
Number of pages	3
DOIs	https://doi.org/10.2172/1039801
State	Published - 2012

NREL Publication Number

NREL/TP-7A10-53835

Keywords

cell efficiency
CRADA
metallization

Access to Document

10.2172/1039801

https://www.nrel.gov/docs/fy12osti/53835.pdf

Cite this

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title = "Metallization for Self Aligned Technology: Cooperative Research and Development Final Report, CRADA Number CRD-08-295",

abstract = "In this CRADA NREL will modify/develop metallization inks that are compatible with 1366 Technologies technology. Various methods of deposition will be used to apply the inks to the textured silicon substrates. The goal of the project is to minimize the contact resistance while maximizing the cell efficiency.",

keywords = "cell efficiency, CRADA, metallization",

author = "David Ginley",

year = "2012",

doi = "10.2172/1039801",

language = "American English",

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AU - Ginley, David

PY - 2012

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N2 - In this CRADA NREL will modify/develop metallization inks that are compatible with 1366 Technologies technology. Various methods of deposition will be used to apply the inks to the textured silicon substrates. The goal of the project is to minimize the contact resistance while maximizing the cell efficiency.

AB - In this CRADA NREL will modify/develop metallization inks that are compatible with 1366 Technologies technology. Various methods of deposition will be used to apply the inks to the textured silicon substrates. The goal of the project is to minimize the contact resistance while maximizing the cell efficiency.

KW - cell efficiency

KW - CRADA

KW - metallization

U2 - 10.2172/1039801

DO - 10.2172/1039801

M3 - Technical Report

ER -

Metallization for Self Aligned Technology: Cooperative Research and Development Final Report, CRADA Number CRD-08-295

Abstract

NREL Publication Number

Keywords

Access to Document

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Cite this