Metalorganic Chemical Vapor Deposition of Very Thin (~2um), Oriented GaAs Layers on Tungsten Substrates

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)836-838
    Number of pages3
    JournalApplied Physics Letters
    Issue number9
    StatePublished - 1982

    Bibliographical note

    Work performed by Electrical, Computer and Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, New York

    NREL Publication Number

    • ACNR/JA-4109

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