Abstract
The present disclosure relates to a method for manufacturing a device, where the device includes, in order, a metamorphic contact layer, a first metamorphic junction, a metamorphic tunnel junction, and a second metamorphic junction. To produce the device, the manufacturing includes, in order, a first depositing of a buffer layer onto a substrate, a second depositing of the metamorphic contact layer, a third depositing of the first metamorphic junction, a fourth depositing of the metamorphic tunnel junction, a fifth depositing of the second metamorphic junction, and the removing of the buffer layer and the substrate.
Original language | American English |
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Patent number | 11,764,326 B2 |
Filing date | 19/09/23 |
State | Published - 2023 |
NREL Publication Number
- NREL/PT-5900-87577
Keywords
- first metamorphic junction
- metamorphic contact layer
- metamorphic tunnel junction
- second metamorphic junction