Abstract
The instant invention teaches a novel method for fabricating silicon solar cells utilizing concentrated solar radiation. The solar radiation is concentrated by use of a solar furnace which is used to form a front surface junction and back surface field in one processing step. The present invention also provides a method of making multicrystalline silicon from amorphous silicon. The invention alsoteaches a method of texturing the surface of a wafer by forming a porous silicon layer on the surface of a silicon substrate and a method of gettering impurities. Also contemplated by the invention are methods of surface passivation, forming novel solar cell structures, and hydrogen passivation.
| Original language | American English |
|---|---|
| Patent number | 5,627,081 |
| State | Published - 1997 |
NREL Publication Number
- NREL/PT-23276