Abstract
Disclosed herein are methods for exfoliation of single crystals allowing for growth of high crystalline quality on the exfoliated surfaces for III-V photovoltaics. Also disclosed herein are methods for growing GaAs (111) on layered-2D Bi.sub.2Se.sub.3 (0001) substrates in an MOCVD reactor.
Original language | American English |
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Patent number | 11,302,531 B2 |
Filing date | 12/04/22 |
State | Published - 2022 |
NREL Publication Number
- NREL/PT-5K00-82642
Keywords
- MOCVD reactor
- selenide-based 2D layered material
- semiconductor device