Abstract
In this study we report on the spatial distribution and composition of residuals on the CdTe surface following a typical wet CdCl2 treatment, and the effect that our ion-beam milling has on this residual-coated surface. Results show that residuals are spatially discrete, located primarily along grain boundaries, and are likely a cadmium oxychloride. Results also show that the residuals may penetrate deep into the CdTe surface such that typical ion-beam milling procedures do not produce complete residual removal.
Original language | American English |
---|---|
Pages | H1101-H1106 |
DOIs | |
State | Published - 2001 |
Event | II-IV Compound Semiconductor Photovoltaic Materials: Materials Research Society Symposium - San Francisco, California Duration: 16 Apr 2001 → 20 Apr 2001 |
Conference
Conference | II-IV Compound Semiconductor Photovoltaic Materials: Materials Research Society Symposium |
---|---|
City | San Francisco, California |
Period | 16/04/01 → 20/04/01 |
NREL Publication Number
- NREL/CP-520-30112