Abstract
Time-resolved photoluminescence (TRPL) measurements indicated minority carrier lifetimes of 15 ns for electrons in 2-μm thick layers of 1.0-eV p-In0.27Ga0.73As grown on 6-inch GaAs wafers. Electron lifetimes increased from 10 ns to 15 ns as the thickness of 1.0-eV p-In0.27Ga0.73As was increased from 0.5 μm to 2 μm. The electron lifetimes decreased from 15 ns for a p-InxGa1-xAs with a doping density of 1×1017 cm-3 to 5 ns for a doping density of 5×1017 cm3. Cathodoluminescence imaging measurements indicated dislocation densities of 7.9×105 cm-2 for a 1.0-μm thick layer of p-In0.27Ga0.73As (1.0eV) at the center of the wafer and 1.4×106 cm-2 towards the edge. Cross-section transmission electron microscopy studies were performed to study dislocation blocking and threading dislocation propagation through the metamorphic graded AllnGaAs layers.
| Original language | American English |
|---|---|
| Pages | 3414-3416 |
| Number of pages | 3 |
| DOIs | |
| State | Published - 15 Oct 2014 |
| Event | 40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, United States Duration: 8 Jun 2014 → 13 Jun 2014 |
Conference
| Conference | 40th IEEE Photovoltaic Specialist Conference, PVSC 2014 |
|---|---|
| Country/Territory | United States |
| City | Denver |
| Period | 8/06/14 → 13/06/14 |
Bibliographical note
Publisher Copyright:© 2014 IEEE.
NLR Publication Number
- NREL/CP-5J00-63759
Keywords
- carrier lifetime
- cathodoluminescence
- InGaAs
- metamorphic layers
- photoluminescence
- photovoltaic cells
- TEM