Abstract
A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.
Original language | American English |
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Patent number | 9,013,018 B2 |
Filing date | 21/04/15 |
State | Published - 2015 |
NREL Publication Number
- NREL/PT-5200-70413
Keywords
- ALD
- atomic layer deposition
- ETFE
- ethylene-tetrafluoroethylene
- fluoropolymers
- interfacial layer
- moisture barrier
- PECVD
- PEN
- PET
- plasma enhanced chemical vapor deposition
- polyethylene naphthalate
- polyethylene terephthalate
- polymer