Multilayer Moisture Barrier

Kent Terwilliger; Joel Pankow; Gary Jorgensen; Stephen Glick; Nora Isomaki; Kari Harkonen; Tommy Turkulainen

Multilayer Moisture Barrier

Kent Terwilliger (Inventor), Joel Pankow (Inventor), Gary Jorgensen (Inventor), Stephen Glick (Inventor), Nora Isomaki (Inventor), Kari Harkonen (Inventor), Tommy Turkulainen (Inventor)

Materials Science

Research output: Patent

Abstract

A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.

Original language	American English
Patent number	9,013,018 B2
Filing date	21/04/15
State	Published - 2015

NREL Publication Number

NREL/PT-5200-70413

Keywords

ALD
atomic layer deposition
ETFE
ethylene-tetrafluoroethylene
fluoropolymers
interfacial layer
moisture barrier
PECVD
PEN
PET
plasma enhanced chemical vapor deposition
polyethylene naphthalate
polyethylene terephthalate
polymer

Access to Document

https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/9013018

Cite this

@misc{57ff7596f0344b228644423e42801aae,

title = "Multilayer Moisture Barrier",

abstract = "A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.",

keywords = "ALD, atomic layer deposition, ETFE, ethylene-tetrafluoroethylene, fluoropolymers, interfacial layer, moisture barrier, PECVD, PEN, PET, plasma enhanced chemical vapor deposition, polyethylene naphthalate, polyethylene terephthalate, polymer",

author = "Kent Terwilliger and Joel Pankow and Gary Jorgensen and Stephen Glick and Nora Isomaki and Kari Harkonen and Tommy Turkulainen",

year = "2015",

language = "American English",

type = "Patent",

note = "9,013,018 B2",

}

TY - PAT

T1 - Multilayer Moisture Barrier

AU - Terwilliger, Kent

AU - Pankow, Joel

AU - Jorgensen, Gary

AU - Glick, Stephen

AU - Isomaki, Nora

AU - Harkonen, Kari

AU - Turkulainen, Tommy

PY - 2015

Y1 - 2015

N2 - A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.

AB - A moisture barrier, device or product having a moisture barrier or a method of fabricating a moisture barrier having at least a polymer layer, and interfacial layer, and a barrier layer. The polymer layer may be fabricated from any suitable polymer including, but not limited to, fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), or ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed by atomic layer deposition (ALD). In embodiments featuring an ALD interfacial layer, the deposited interfacial substance may be, but is not limited to, Al2O3, AlSiOx, TiO2, and an Al2O3/TiO2 laminate. The barrier layer associated with the interfacial layer may be deposited by plasma enhanced chemical vapor deposition (PECVD). The barrier layer may be a SiOxNy film.

KW - ALD

KW - atomic layer deposition

KW - ETFE

KW - ethylene-tetrafluoroethylene

KW - fluoropolymers

KW - interfacial layer

KW - moisture barrier

KW - PECVD

KW - PEN

KW - PET

KW - plasma enhanced chemical vapor deposition

KW - polyethylene naphthalate

KW - polyethylene terephthalate

KW - polymer

M3 - Patent

M1 - 9,013,018 B2

Y2 - 2015/04/21

ER -

Multilayer Moisture Barrier

Abstract

NREL Publication Number

Keywords

Access to Document

Fingerprint

Cite this