Abstract
Tin monosulfide (SnS) usually exhibits p-type conduction due to the low formation enthalpy of acceptor-type defects, and as a result, n-type SnS thin films have never been obtained. In this paper, we realize n-type conduction in SnS thin films by using radiofrequency-magnetron sputtering with Cl doping and a sulfur plasma source during deposition. Here, n-type SnS thin films are obtained at all the substrate temperatures employed in this paper (221-341 °C), exhibiting carrier concentrations and Hall mobilities of ∼2×1018cm-3 and 0.1-1cm2V-1s-1, respectively. The films prepared without a sulfur plasma source, on the other hand, exhibit p-type conduction despite containing a comparable amount of Cl donors. This is likely due to a significant number of acceptor-type defects originating from sulfur deficiency in p-type films, which appears as a broad optical absorption within the band gap. We demonstrate n-type SnS thin films in this paper for the realization of SnS homojunction solar cells, which are expected to have a higher conversion efficiency than the conventional heterojunction SnS solar cells.
Original language | American English |
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Article number | 125405 |
Number of pages | 8 |
Journal | Physical Review Materials |
Volume | 5 |
Issue number | 12 |
DOIs | |
State | Published - Dec 2021 |
Bibliographical note
Publisher Copyright:© 2021 authors. Published by the American Physical Society.
NREL Publication Number
- NREL/JA-5K00-80034
Keywords
- doping
- mobility
- plasma
- semiconductor
- tin sulfide