Abstract
Passivated tunneling contacts offer promise for applications in Interdigitated Back Passivated Contact (IBPC) high efficiency silicon solar cells. Metallization of these contacts remains a key research topic. This paper investigates NiSi/poly-Si/SiO2/c-Si passivated contacts using photoluminescence and contact resistivity measurements. An amorphous Si interlayer between the NiSi and poly-Si is observed to improve passivation, decreasing recombination. The overall recombination loss has a linear trend with the NiSi thickness. Implied Voc values close to 700 mV and contact resistivities below 10 mohm-cm2 have been achieved in NiSi/poly-Si:P/SiO2/c-Si contacts.
| Original language | American English |
|---|---|
| Pages | 2479-2482 |
| Number of pages | 4 |
| DOIs | |
| State | Published - 18 Nov 2016 |
| Event | 43rd IEEE Photovoltaic Specialists Conference, PVSC 2016 - Portland, United States Duration: 5 Jun 2016 → 10 Jun 2016 |
Conference
| Conference | 43rd IEEE Photovoltaic Specialists Conference, PVSC 2016 |
|---|---|
| Country/Territory | United States |
| City | Portland |
| Period | 5/06/16 → 10/06/16 |
Bibliographical note
Publisher Copyright:© 2016 IEEE.
NLR Publication Number
- NREL/CP-5J00-67953
Keywords
- conductivity
- nickel alloys
- optical reflection
- photovoltaic cells
- silicides
- silicon