Nitrogen-Doped Nickel Oxide Thin Films for Enhanced Electrochromic Applications

Feng Lin, Dane T. Gillaspie, Anne C. Dillon, Ryan M. Richards, Chaiwat Engtrakul

Research output: Contribution to journalArticlepeer-review

46 Scopus Citations

Abstract

In this work, Ni oxide and nitrogen (N)-doped Ni oxide electrochromic films were fabricated with radio frequency magnetron sputtering from a ceramic Ni oxide target. Nitrogen gas was used as the precursor for N doping. The N dopant resulted in Ni oxide films with decreased lattice parameters, increased degree of crystallinity and enhanced surface roughness. The electrochromic performance of the resulting films was evaluated in a LiClO4 electrolyte dissolved in propylene carbonate. The charge reversibility and coloration efficiency as well as the coloration and bleaching kinetics for the N-doped Ni oxide films were significantly improved relative to the undoped Ni oxide films.

Original languageAmerican English
Pages (from-to)26-30
Number of pages5
JournalThin Solid Films
Volume527
DOIs
StatePublished - 1 Jan 2013

NREL Publication Number

  • NREL/JA-5900-55282

Keywords

  • coloration efficiency
  • electrochromic properties
  • nitrogen-doped nickel oxide
  • reversability

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