Nitrogen-Doped Nickel Oxide Thin Films for Enhanced Electrochromic Applications

Feng Lin; Dane T. Gillaspie; Anne C. Dillon; Ryan M. Richards; Chaiwat Engtrakul

doi:10.1016/j.tsf.2012.12.031

Nitrogen-Doped Nickel Oxide Thin Films for Enhanced Electrochromic Applications

Feng Lin, Dane T. Gillaspie, Anne C. Dillon, Ryan M. Richards, Chaiwat Engtrakul

Chemistry and Nanoscience

Research output: Contribution to journal › Article › peer-review

53 Scopus Citations

Abstract

In this work, Ni oxide and nitrogen (N)-doped Ni oxide electrochromic films were fabricated with radio frequency magnetron sputtering from a ceramic Ni oxide target. Nitrogen gas was used as the precursor for N doping. The N dopant resulted in Ni oxide films with decreased lattice parameters, increased degree of crystallinity and enhanced surface roughness. The electrochromic performance of the resulting films was evaluated in a LiClO₄ electrolyte dissolved in propylene carbonate. The charge reversibility and coloration efficiency as well as the coloration and bleaching kinetics for the N-doped Ni oxide films were significantly improved relative to the undoped Ni oxide films.

Original language	American English
Pages (from-to)	26-30
Number of pages	5
Journal	Thin Solid Films
Volume	527
DOIs	https://doi.org/10.1016/j.tsf.2012.12.031 https://doi.org/10.1016/j.tsf.2012.12.031
State	Published - 1 Jan 2013

NREL Publication Number

NREL/JA-5900-55282

Keywords

coloration efficiency
electrochromic properties
nitrogen-doped nickel oxide
reversability

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title = "Nitrogen-Doped Nickel Oxide Thin Films for Enhanced Electrochromic Applications",

abstract = "In this work, Ni oxide and nitrogen (N)-doped Ni oxide electrochromic films were fabricated with radio frequency magnetron sputtering from a ceramic Ni oxide target. Nitrogen gas was used as the precursor for N doping. The N dopant resulted in Ni oxide films with decreased lattice parameters, increased degree of crystallinity and enhanced surface roughness. The electrochromic performance of the resulting films was evaluated in a LiClO4 electrolyte dissolved in propylene carbonate. The charge reversibility and coloration efficiency as well as the coloration and bleaching kinetics for the N-doped Ni oxide films were significantly improved relative to the undoped Ni oxide films.",

keywords = "coloration efficiency, electrochromic properties, nitrogen-doped nickel oxide, reversability",

author = "Feng Lin and Gillaspie, \{Dane T.\} and Dillon, \{Anne C.\} and Richards, \{Ryan M.\} and Chaiwat Engtrakul",

year = "2013",

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day = "1",

doi = "10.1016/j.tsf.2012.12.031",

language = "American English",

volume = "527",

pages = "26--30",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Nitrogen-Doped Nickel Oxide Thin Films for Enhanced Electrochromic Applications

AU - Lin, Feng

AU - Gillaspie, Dane T.

AU - Dillon, Anne C.

AU - Richards, Ryan M.

AU - Engtrakul, Chaiwat

PY - 2013/1/1

Y1 - 2013/1/1

N2 - In this work, Ni oxide and nitrogen (N)-doped Ni oxide electrochromic films were fabricated with radio frequency magnetron sputtering from a ceramic Ni oxide target. Nitrogen gas was used as the precursor for N doping. The N dopant resulted in Ni oxide films with decreased lattice parameters, increased degree of crystallinity and enhanced surface roughness. The electrochromic performance of the resulting films was evaluated in a LiClO4 electrolyte dissolved in propylene carbonate. The charge reversibility and coloration efficiency as well as the coloration and bleaching kinetics for the N-doped Ni oxide films were significantly improved relative to the undoped Ni oxide films.

AB - In this work, Ni oxide and nitrogen (N)-doped Ni oxide electrochromic films were fabricated with radio frequency magnetron sputtering from a ceramic Ni oxide target. Nitrogen gas was used as the precursor for N doping. The N dopant resulted in Ni oxide films with decreased lattice parameters, increased degree of crystallinity and enhanced surface roughness. The electrochromic performance of the resulting films was evaluated in a LiClO4 electrolyte dissolved in propylene carbonate. The charge reversibility and coloration efficiency as well as the coloration and bleaching kinetics for the N-doped Ni oxide films were significantly improved relative to the undoped Ni oxide films.

KW - coloration efficiency

KW - electrochromic properties

KW - nitrogen-doped nickel oxide

KW - reversability

UR - https://www.scopus.com/pages/publications/84872616582

U2 - 10.1016/j.tsf.2012.12.031

DO - 10.1016/j.tsf.2012.12.031

M3 - Article

AN - SCOPUS:84872616582

SN - 0040-6090

VL - 527

SP - 26

EP - 30

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Nitrogen-Doped Nickel Oxide Thin Films for Enhanced Electrochromic Applications

Abstract

NREL Publication Number

Keywords

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