Abstract
In this work the characteristics of hydrogen clusters in hot filament assisted CVD and conventional glow discharge a-Si:H films are discussed. Computer simulations of the observed free-induction decays of the 1H NMR signals indicate that the distribution of the nearest-neighbor distances between H atoms in the H clusters is quite narrow in hot filament assisted CVD a-Si:H whereas the distributionis larger in glow discharge a-Si:H. This is clear evidence of improved structural order in hot filament assisted CVD a-Si:H. The relaxed hydrogenated divacancy and multi-vacancy models reproduce the main features of the observed free-induction decay in hot-wire a-Si:H very well. Computer simulations of the multiple-quantum NMR spectra indicate that a relaxed hydrogenated divacancy configurationleads to good agreement with experimental observations in device quality glow discharge a-Si:H. Results of simulations based on other H cluster configurations are also discussed. These results provide restrictions on the possible models for H clusters in a-Si:H.
Original language | American English |
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Pages | 159-164 |
Number of pages | 6 |
State | Published - 1997 |
Event | Amorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium - San Francisco, California Duration: 31 Mar 1997 → 4 Apr 1997 |
Conference
Conference | Amorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium |
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City | San Francisco, California |
Period | 31/03/97 → 4/04/97 |
Bibliographical note
Work performed by University of North Carolina, Chapel Hill, North CarolinaNREL Publication Number
- NREL/CP-520-24546