NMR Investigation of H Cluster Configurations in A-Si:H

    Research output: Contribution to conferencePaper

    Abstract

    In this work the characteristics of hydrogen clusters in hot filament assisted CVD and conventional glow discharge a-Si:H films are discussed. Computer simulations of the observed free-induction decays of the 1H NMR signals indicate that the distribution of the nearest-neighbor distances between H atoms in the H clusters is quite narrow in hot filament assisted CVD a-Si:H whereas the distributionis larger in glow discharge a-Si:H. This is clear evidence of improved structural order in hot filament assisted CVD a-Si:H. The relaxed hydrogenated divacancy and multi-vacancy models reproduce the main features of the observed free-induction decay in hot-wire a-Si:H very well. Computer simulations of the multiple-quantum NMR spectra indicate that a relaxed hydrogenated divacancy configurationleads to good agreement with experimental observations in device quality glow discharge a-Si:H. Results of simulations based on other H cluster configurations are also discussed. These results provide restrictions on the possible models for H clusters in a-Si:H.
    Original languageAmerican English
    Pages159-164
    Number of pages6
    StatePublished - 1997
    EventAmorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium - San Francisco, California
    Duration: 31 Mar 19974 Apr 1997

    Conference

    ConferenceAmorphous and Microcrystalline Silicon Technology 1997: Materials Research Society Symposium
    CitySan Francisco, California
    Period31/03/974/04/97

    Bibliographical note

    Work performed by University of North Carolina, Chapel Hill, North Carolina

    NREL Publication Number

    • NREL/CP-520-24546

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