Abstract
High quality III-Vs on Si are a promising candidate for high efficiency, cost-effective tandem solar cells due to the superior optoelectronic properties of III-Vs and low cost of Si. In recent years, progress towards the integration of high-quality, monolithically-grown III-Vs on Si has been made through careful control of the GaP on Si nucleation step [1]. A variety of pretreatments have successfully been used to modify the surface reconstruction of the Si to prevent the formation of antiphase domains (APDs) [2]- [5]. This has led to promising III-V/Si multijuction solar cell results, with efficiencies now exceeding 20% [6], [7].
| Original language | American English |
|---|---|
| Pages | 352-353 |
| Number of pages | 2 |
| DOIs | |
| State | Published - 14 Jun 2020 |
| Event | 47th IEEE Photovoltaic Specialists Conference, PVSC 2020 - Calgary, Canada Duration: 15 Jun 2020 → 21 Aug 2020 |
Conference
| Conference | 47th IEEE Photovoltaic Specialists Conference, PVSC 2020 |
|---|---|
| Country/Territory | Canada |
| City | Calgary |
| Period | 15/06/20 → 21/08/20 |
Bibliographical note
Publisher Copyright:© 2020 IEEE.
NLR Publication Number
- NREL/CP-5900-75915
Keywords
- heteroepitaxy
- III-Vs
- nanopatterning
- Si tandem solar cells