Optical and Electrical Properties of a-Si:H Films Grown by Remote Plasma Enhanced Chemical Vapor Deposition (RPECVD)

    Research output: Contribution to journalArticle

    Original languageAmerican English
    Pages (from-to)1375-1378
    Number of pages4
    JournalJournal of Non-Crystalline Solids
    Volume97 & 98, Part II
    DOIs
    StatePublished - 1987

    Bibliographical note

    Work performed by Department of Physics, North Carolina State University, Raleigh, North Carolina

    NREL Publication Number

    • ACNR/JA-10056

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