Abstract
An in situ optical metrology has been developed to provide real time control of three crucial film properties during the 3-stage deposition of Cu(In1-xGax)Se2 thin films. These properties include: (1) the overall Cu/(In+Ga) ratio; (2) the distribution of indium and gallium between the 1st and 3rd stages; and (3) the film thickness. The accuracy and reliability of this metrology were experimentally verified. It has been established as a routine process control tool for CIGS depositions at NREL. This metrology greatly expands the parameter space that can be systematically explored. It also holds the promise for applications in PV module manufacturing.
Original language | American English |
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Pages | 2609-2611 |
Number of pages | 3 |
DOIs | |
State | Published - 2013 |
Event | 39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States Duration: 16 Jun 2013 → 21 Jun 2013 |
Conference
Conference | 39th IEEE Photovoltaic Specialists Conference, PVSC 2013 |
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Country/Territory | United States |
City | Tampa, FL |
Period | 16/06/13 → 21/06/13 |
NREL Publication Number
- NREL/CP-5200-57843
Keywords
- 3-stage deposition
- Optical metrology
- Process control
- Thin film