Optical Metrology for Real Time Control of Elemental Composition, Distribution, and Thickness of Cu(In1-xGax)Se2 Thin Films

Jian Li, Miguel Contreras, John Scharf, Matthew Young, Thomas E. Furtak, Rommel Noufi, Dean Levi

Research output: Contribution to conferencePaperpeer-review

2 Scopus Citations

Abstract

An in situ optical metrology has been developed to provide real time control of three crucial film properties during the 3-stage deposition of Cu(In1-xGax)Se2 thin films. These properties include: (1) the overall Cu/(In+Ga) ratio; (2) the distribution of indium and gallium between the 1st and 3rd stages; and (3) the film thickness. The accuracy and reliability of this metrology were experimentally verified. It has been established as a routine process control tool for CIGS depositions at NREL. This metrology greatly expands the parameter space that can be systematically explored. It also holds the promise for applications in PV module manufacturing.

Original languageAmerican English
Pages2609-2611
Number of pages3
DOIs
StatePublished - 2013
Event39th IEEE Photovoltaic Specialists Conference, PVSC 2013 - Tampa, FL, United States
Duration: 16 Jun 201321 Jun 2013

Conference

Conference39th IEEE Photovoltaic Specialists Conference, PVSC 2013
Country/TerritoryUnited States
CityTampa, FL
Period16/06/1321/06/13

NREL Publication Number

  • NREL/CP-5200-57843

Keywords

  • 3-stage deposition
  • Optical metrology
  • Process control
  • Thin film

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