Optical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition

Jian Li, Stephen Glynn, Steven Christensen, Jonathan Mann, Bobby To, Kannan Ramanathan, Rommel Noufi, Thomas E. Furtak, Dean Levi

Research output: Contribution to conferencePaperpeer-review

1 Scopus Citations

Abstract

Zn(O,S) thin films 27 - 100 nm thick were deposited on glass or Cu(In xGa1-x)Se2/Molybdenum/glass with RF sputtering, atomic layer deposition, and chemical bath deposition. The complex dielectric functions ε of these films were extracted by spectroscopic ellipsometry and transmission analyses. It is found that varies on a large scale, indicative of significant variations in the films' chemical and physical properties, with the growth methods and deposition parameters. By fitting the spectra based on the parabolic band approximation, the E0 critical point energies and broadening parameters were quantified to provide insights on the band gap, defect density, and phase segregation.

Original languageAmerican English
Pages1580-1583
Number of pages4
DOIs
StatePublished - 2012
Event38th IEEE Photovoltaic Specialists Conference, PVSC 2012 - Austin, TX, United States
Duration: 3 Jun 20128 Jun 2012

Conference

Conference38th IEEE Photovoltaic Specialists Conference, PVSC 2012
Country/TerritoryUnited States
CityAustin, TX
Period3/06/128/06/12

Bibliographical note

See CP-5200-54128 for preprint

NREL Publication Number

  • NREL/CP-5200-56912

Keywords

  • dielectric constant
  • ellipsometry
  • nanocrystals
  • photovoltaic cells
  • thin films
  • wide band gap semiconductors
  • Zinc compounds

Fingerprint

Dive into the research topics of 'Optical Properties of Zn(O,S) Thin Films Deposited by RF Sputtering, Atomic Layer Deposition, and Chemical Bath Deposition'. Together they form a unique fingerprint.

Cite this