Opto-Electronic Properties of Co-Zn-Ni-O Films Deposited by RF-Sputtering at Ambient-Temperature

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Abstract

Co-Zn-Ni-O thin films were grown on glass at ambient temperature (TS < 65 °C) by co-sputtering from Co3O4, ZnO, and NiO targets to determine the structural and opto-electronic properties across the ternary composition space. Compositional domains with spinel, wurtzite, rock-salt, and mixed phases were observed, albeit with very weak X-ray diffraction peaks, overall suggesting the likely presence of a co-existent amorphous component. The electrical conductivity had a maximum value of ∼35 S/cm that occurs where the optical absorption is also the strongest. The work functions range from 5.0 to 5.8 eV for all samples, but with no clear composition-based trends. Overall, it appears that the optoelectronic properties of the Co-Zn-Ni-O materials are much less sensitive to substrate temperature compared to other p-type oxide semiconductors, resulting in technologically-relevant ambient-temperature-deposited thin films.

Original languageAmerican English
Pages (from-to)409-414
Number of pages6
JournalJournal of Alloys and Compounds
Volume801
DOIs
StatePublished - 15 Sep 2019

Bibliographical note

Publisher Copyright:
© 2019 The Authors

NLR Publication Number

  • NREL/JA-5K00-68962

Keywords

  • Crystal structure
  • Electrical transport
  • Optical properties
  • Oxide materials
  • Thin films
  • Vapor deposition

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